Semiconductor mounting substrate and method for manufacturing the same

ABSTRACT

A semiconductor mounting substrate according to the present invention comprises: a substrate; a semiconductor device, mounted on this substrate; solder bumps, which connect the semiconductor device and the substrate; a first resin, filled in a space between the semiconductor device and the substrate; and electronic components, mounted on a face side of the semiconductor device where the semiconductor device is mounted, wherein bond strength reinforcing resin section is provided at least between a side face in the vicinity of a corner part of the semiconductor device and a substrate surface of the substrate in a position corresponding to the corner part.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor mounting substrate onwhich a semiconductor device is mounted via solder bumps, and a methodfor manufacturing the same.

2. Description of the Related Art

In the following, a conventional semiconductor mounting substrate isdescribed with reference to drawings. FIG. 13 is a front view of aconventional semiconductor mounting substrate. FIG. 14 is an expandedfront view of a mounting condition of a corner part of a semiconductordevice on this semiconductor mounting substrate. Recently, in order torespond to the demand for reduction in size of devices, semiconductormounting substrate 10 has appeared which is obtained by flip-chipmounting semiconductor device 2 facedown on substrate 1, as shown inFIG. 13. Such a mounting means has been applied especially to mobiledevices, typified by cellular phones, for achieving both portability andhigh functionality.

In such semiconductor mounting substrate 10, semiconductor device 2 andelectronic component 3 are mounted on substrate 1, as shown in FIGS. 13and 14. Solder bumps 4 are formed on semiconductor device 2, andsemiconductor device 2 is connected to substrate 1 via solder bumps 4.Resin 5 is filled between substrate 1 and semiconductor device 2.

Here, as shown in FIG. 14, resin film (so called rewiring layer) 2 b isformed on a lower face side of silicon substrate 2 a in semiconductordevice 2. Wiring formed on this resin film 2 b connects a circuit (notshown) formed on silicon substrate 2 a and solder bumps 4, as shown inFIG. 13.

It is to be noted that as a prior art document information related toinvention of such a semiconductor mounting substrate, for example,Unexamined Japanese Patent Publication No. H08-241900 is known.

Next, a method for manufacturing the conventional semiconductor mountingsubstrate is described with reference to drawings. FIG. 15 is amanufacturing flowchart for the conventional semiconductor mountingsubstrate, FIG. 16A is a plan view of a semiconductor mounting substratein an injection process in the manufacturing flowchart, and FIG. 16B isa front view of the semiconductor mounting substrate in the sameinjection process. In the following, a method for manufacturing theconventional semiconductor mounting substrate is described in the orderof processes shown in FIG. 15.

Application process S1 is a process of supplying substrate 1 with solder4 a and flux 4 b. It is to be noted that cream solder is used as solder4 a. Mounting process S2 after application process S1 is a process ofmounting chip components 3 a and semiconductor device 2 on substrate 1.At this time, chip component 3 a and semiconductor device 2 are mountedwith a spacing of about 0.15 mm therebetween. It is to be noted that asemiconductor device provided with solder bumps (not shown) is appliedto semiconductor device 2. Reflow process S3 after mounting process S2is a process of melting solder 4 a and the solder bumps so that chipcomponents 3 a and semiconductor device 2 are connected to substrate 1.

Injection process S4 after reflow process S3 is a process of injectingresin 5 into a gap between semiconductor device 2 and substrate 1. Inhardening process S5 after this injection process S4, resin 5 ishardened, to complete semiconductor mounting substrate 10.

It is to be noted that as a prior art document related to invention ofsuch a method for manufacturing the semiconductor mounting substrate,for example, Unexamined Japanese Patent Publication No. H11-214586 isknown.

However, in the case of filling first resin 5 between substrate 1 andsemiconductor device 2 in such a conventional semiconductor mountingsubstrate, as shown in FIGS. 13 and 14, interface 2 e between siliconsubstrate 2 a and resin film 2 b is not covered by first resin 5 andcomes into an exposed state on side face 2 c of the corner part ofsemiconductor device 2. When interface 2 e comes into the exposed stateas thus described, connection strength between silicon substrate 2 a andresin film 2 b is decreased. Hence there is a problem in that, whensemiconductor mounting substrate 10 is dropped, peeling is apt to occurin interface 2 e portion between silicon substrate 2 a and resin film 2b.

Next, a problem with the method for manufacturing the conventionalsemiconductor mounting substrate shown in FIGS. 15, 16A and 16B isdescribed. FIG. 17A is a sectional view of chip component 3 a mounted onthe conventional semiconductor mounting substrate (not shown), and FIG.17B is a sectional view of a soldered place of chip component 3 a shownin FIG. 17A, seen from a line 17B-17B.

In such a method for manufacturing conventional semiconductor mountingsubstrate 10, when a distance between semiconductor device 2 andadjacent chip component 3 a is small, adjacent electronic component 3 aand solder 4 a are covered by first resin 5 in injection of first resin5 between substrate 1 and semiconductor device 2. Here, a space betweenchip component 3 a and substrate 1 is narrower than a space betweensubstrate 1 and semiconductor device 2. Thereby, first resin 5 isresistant to entering into the space between chip component 3 a andsubstrate 1. Therefore, as shown in FIGS. 17A and 17B, chip component 3a and solder 4 a are covered by first resin 5 in a state where unfilledvoid 7 is formed between chip component 3 a and substrate 1.

Further, for example when such semiconductor mounting substrate 10 isreflow-soldered to a parent substrate (not shown), solder 4 a melts byheating. Since solder 4 a is covered by first resin 5 except in void 7at this time, solder 4 a begins flowing in directions of arrows 7 a invoid 7 due to cubical expansion in melting of the solder. Solder 4 athen flows into a lower side of chip component 3 a from both sides ofvoid 7, to cause a short circuit. Therefore, there has been a problemwith conventional semiconductor mounting substrate 10 in that thedistance between chip component 3 a and semiconductor device 2 cannot bemade small, thereby preventing high-density mounting.

SUMMARY OF THE INVENTION

The present invention solves the above-mentioned problems, and providesa highly reliable semiconductor mounting substrate having large droppingstrength and a method for manufacturing the same.

That is, a semiconductor mounting substrate of the present inventionincludes: a substrate; a semiconductor device, mounted on thissubstrate; solder bumps, which connect this semiconductor device and thesubstrate; a first resin, filled in a space between the semiconductordevice and the substrate; and electronic components, mounted on a faceside of the semiconductor device where the semiconductor device ismounted, wherein a bond strength reinforcing resin section is providedat least between a side face in the vicinity of a corner part of thesemiconductor device and a surface of the substrate in a positioncorresponding to the corner part.

With such a configuration formed, the first resin also adheres to theside face in the vicinity of the corner part of the semiconductordevice. The first resin then creeps up in the space between thesemiconductor device and the electronic component due to its interfacialtension and capillary phenomenon, to form the bond strength reinforcingresin section. This thus produces an effect of being able to provide asemiconductor mounting substrate which has large dropping strength andis not susceptible to dropping and the like and on which thesemiconductor device, the electronic components and the like aremounted.

Since the electronic components can be mounted with a general-purposemounting machine, excellent productivity is obtained. Further, since theelectronic component is capable of also serving as part of a circuitconfigured on the semiconductor mounting substrate, it is possible toeliminate the need to provide an extra component, so as to realize aninexpensive semiconductor mounting substrate.

Moreover, a method for manufacturing a semiconductor mounting substrateaccording to the present invention includes: a connection membersupplying process of supplying a connection member onto connection landsprovided on a substrate; a mounting process of mounting a semiconductordevice and electronic components on the substrate; a reflow process ofheating the semiconductor device and the electronic components on thesubstrate, to be connected and mounted onto the substrate; and a resinfilling process of filling a first resin into a space between thesemiconductor device and the substrate from a central part of a sideface of the semiconductor device, and then hardening the resin, whereinin the resin filling process, after injection and filling of the firstresin into the space, a bond strength reinforcing resin section isprovided at least between a side face in the vicinity of a corner partof the semiconductor device and a surface of the substrate in a positioncorresponding to the corner part

With such a configuration formed, the first resin also adheres to theside face in the vicinity of the corner part of the semiconductordevice. The first resin then creeps up in the space between thesemiconductor device and the electronic component due to interfacialtension and capillary phenomenon, to form the bond strength reinforcingresin section. This thus produces an effect of being able to provide asemiconductor mounting substrate which has large dropping strength andis not susceptible to dropping and the like and on which thesemiconductor device, the electronic components and the like aremounted. Further, the semiconductor device, the electronic componentsand the like are mounted such that the first resin creeps up in thespace between the semiconductor device and the electronic component,thereby also producing an effect of being able to mount these componentswith high density.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 shows a plan view of a semiconductor mounting substrate accordingto a first embodiment of the present invention;

FIG. 2 shows a side view of the semiconductor mounting substrateaccording to the first embodiment of the present invention;

FIG. 3 shows an expanded sectional view of a main part of thesemiconductor mounting substrate according to the first embodiment ofthe present invention;

FIG. 4 shows a manufacturing flowchart for the semiconductor mountingsubstrate according to the first embodiment of the present invention;

FIG. 5 shows a plan view of a substrate according to the firstembodiment of the present invention;

FIG. 6 shows a plan view of a semiconductor mounting substrate in amounting process according to a second embodiment of the presentinvention;

FIG. 7A shows a plan view of a semiconductor mounting substrateaccording to a third embodiment of the present invention;

FIG. 7B shows a front view of the semiconductor mounting substrateaccording to the third embodiment of the present invention;

FIG. 8 shows a manufacturing flowchart for the semiconductor mountingsubstrate according to the third embodiment of the present invention;

FIG. 9A shows a plan view of the semiconductor mounting substrate in areflow process shown in FIG. 8;

FIG. 9B shows a front view of the semiconductor mounting substrate inthe reflow process shown in FIG. 8;

FIG. 10A shows a plan view of the semiconductor mounting substrate in aninjection process shown in FIG. 8;

FIG. 10B shows a front view of the semiconductor mounting substrate inthe injection process shown in FIG. 8;

FIG. 11A shows a plan view of the semiconductor mounting substrate in aresin applying process according to the third embodiment of the presentinvention;

FIG. 11B shows a front view of the semiconductor mounting substrate inthe resin applying process according to the third embodiment of thepresent invention;

FIG. 12 shows a front view of the semiconductor mounting substrate in aninversion process according to the third embodiment of the presentinvention;

FIG. 13 shows a front view of a conventional semiconductor mountingsubstrate;

FIG. 14 shows an expanded front view of a main part of the conventionalsemiconductor mounting substrate;

FIG. 15 shows a manufacturing flowchart for the conventionalsemiconductor mounting substrate;

FIG. 16A shows a plan view of the semiconductor mounting substrate in aninjection process shown in FIG. 15;

FIG. 16B shows a front view of the semiconductor mounting substrate inthe injection process shown in FIG. 15;

FIG. 17A shows a sectional view of a chip component mounted on theconventional semiconductor mounting substrate; and

FIG. 17B shows a sectional view seen from a line 17B-17B of FIG. 17A.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

Below, an embodiment of the present invention is described withreference to drawings. In the following drawings, dimensions areexpanded for facilitating understanding of configurations. Further,since the same element is provided with the same numeral, itsdescription may be omitted.

First Embodiment

Semiconductor mounting substrate 11 according to a first embodiment ofthe present invention is described below with reference to drawings.FIG. 1 is a plan view of semiconductor mounting substrate 11 accordingto the first embodiment of the present invention, FIG. 2 is a side viewof the same, and FIG. 3 is an expanded sectional view of the same. It isto be noted that in FIGS. 1 to 3, the same elements as those in theconventional examples shown in FIGS. 13 to 17 are provided with the samenumerals as those in the conventional examples so as to simplifydescriptions of those elements.

In FIGS. 1 to 3, semiconductor device 2 and electronic components 3 aremounted on substrate 12. Semiconductor device 2 is connected tosubstrate 12 via solder bumps 4. Meanwhile, electronic component 3 isconnected to substrate 12 via solder 13. Here, since the dimensions ofsolder bump 4 are on the order of 100 μm, connection strength betweensemiconductor device 2 and substrate 12 is small. In order to compensatesuch connection strength between semiconductor device 2 and substrate12, a space between semiconductor device 2 and substrate 12 is filledwith first resin 5.

First resin 5 is filled so as to reach corner part 6 of semiconductordevice 2. At this time, first resin 5 reaches central part 2 d of sideface 2 c of semiconductor device 2 earlier. Therefore, in central part 2d, first resin 5 flows out from the space between semiconductor device 2and substrate 12 and creeps up along side face 2 c, first resin 5 coversinterface 2 e between silicon substrate 2 a and resin film 2 b in thevicinity of central part 2 d.

Meanwhile, first resin 5 having reached corner part 6 creeps up in space14 formed between corner part 6 of semiconductor device 2 and insulatingportion 3 b of electronic component 3 due to the capillary phenomenon,to form and provide bond strength enforcing resin section 5 a.

It is to be noted that bond strength enforcing resin section 5 a isprovided at least between side face 2 c in the vicinity of corner part 6of semiconductor device 2 and surface 12 a of substrate 12 in a positioncorresponding to corner part 6. For forming space 14 where first resin 5is made to creep up, electronic component 3 is arranged so as to comeclose to corner part 6 of semiconductor device 2. In addition,insulating portion 3 b of electronic component 3 is mounted so as to belocated correspondingly to corner part 6. Since this makes first resin 5resistant to covering solder 13, solder 13 resists disturbing anoperation when electronic component 3 is exchanged for repair or thelike.

Here, for facilitating the first resin 5 to creep up in space 14 atcorner part 6, gap 15 of space 14 is desirably made smaller than gap 16from surface of substrate 12 to resin film 2 b. In the present firstembodiment, gap 16 is set to about 110 μm. This is aimed at completelyfilling first resin 5 to corner part 6, so as to prevent occurrence of avoid or the like within first resin 5. Therefore, gap 15 of space 14 isset to 100 μm in the present first embodiment.

Further, typically, space 17 occurs between electronic component 3 andsubstrate 12. However, with space 17 present, first resin 5 flows intospace 17 when creeping up, and it thus becomes hard for first resin 5 tocreep up in space 14. In the present first embodiment, connectionconductor 18 is formed in a place below insulating portion 3 b ofelectronic component 3, and insulating film 19 is formed so as to coveran upper face of this conductor 18. Since this can make space 17 that isformed below insulating portion 3 b of electronic component 3 small,first resin 5 becomes resistant to being absorbed into space 17, andbecomes apt to creep up in space 14.

Moreover, electronic component 3 is desirably mounted with a sharp sidecorner 3 c of insulating portion 3 b turned downward. A condenser, aresistor, an inductor, and the like are typically cut into chip shapeprior to burning. At this time, shear dropping occurs on a side where acutting tooth enters, and corner 3 c on the opposite side thereto isformed into cut shape. In the present first embodiment, this aspect isfocused on, and in the case of mounting electronic component 3, mountingis performed so as to turn the sharp-side corner 3 c downward. Thereby,space 17 between electronic component 3 and substrate 12 can be madesmaller so that space first resin 5 becomes resistant to being absorbedinto space 17 and becomes apt to creep up in space 14.

Here, it is of importance to use electronic component 3 which makesheight 20 from substrate surface 12 a of substrate 12 to upper face 3 dof electronic component 3 larger than at least interface height 20 bfrom substrate surface 12 a of substrate 12 to interface 2 e. This isbecause first resin 5 has to creep up to interface height 20 b due tothe capillary phenomenon between side face 2 c of semiconductor device 2and a side face of insulating portion 3 b of electronic component 3.

It is to be noted that first resin 5 having crept up in space 14 isformed in concave shape with the center of space 14 recessed due tointerfacial tension of first resin 5. Hence height 20 a of the lowestpoint of the recess is desirably made not smaller than interface height20 b. Here, first resin 5 creeps up by creep-up dimensions 22 from abottom of the recession due to the interfacial tension in insulatingportion 3 b. Therefore, in the present first embodiment, electroniccomponent 3 is used which makes a difference between upper face 3 d ofelectronic component 3 and interface height 20 b not smaller thancreep-up dimensions 22. Since this can make height 20 a of the bottom ofthe recess larger than interface height 20 b, interface 2 e betweensilicon substrate 2 a and resin film 2 b is reliably covered by firstresin 5. Therefore, even with impulsive force applied to semiconductormounting substrate 11, it is possible to make cracking and the likehardly occur.

In the following, a method for manufacturing semiconductor mountingsubstrate 11 in present first embodiment is described with reference todrawings. FIG. 4 is a manufacturing flowchart for semiconductor mountingsubstrate 11 in the present first embodiment, FIG. 5 is a plan view ofsubstrate 12 in the same. It is to be noted that in FIGS. 4 and 5, thesame elements as those in FIGS. 1 to 3 are provided with the samenumerals so as to simplify descriptions of those elements.

In FIGS. 4 and 5, connection lands 31 on which semiconductor device 2 ismounted and connection lands 32 to which electronic components 3 areconnected are formed on substrate 12. In addition, although insulatingfilm 19 is formed on substrate 12, non-formation section 33 andnon-formation section 34 a of insulating film 19 are formed inrespective positions corresponding to connection lands 31 and connectionlands 32.

First, connection member supplying process 41 is a process of supplyinga connection member onto substrate 12, flux 4 b is applied ontoconnection lands 31 and solder 13 in paste form is applied ontoconnection lands 32.

Mounting process 42 is a process of mounting semiconductor device 2 andelectronic components 3 on the respective connection lands 31 and 32after connection member supplying process 41. It is to be noted thatsolder bumps 4 (not shown) are formed in positions corresponding torespective connection lands 31. In reflow process 43 after mountingprocess 42, solder bumps 4 and solder 13 are heated and melt so thatsemiconductor device 2 and electronic components 3 are connected andfixed to substrate 12.

Resin filling process 44 is a process of filling thermosetting firstresin 5 into a space between semiconductor device 2 and substrate 12 andthen hardening the resin, after reflow process 43. Resin filling process44 is made up of injection process 45 in the first half and hardeningprocess 46 in the last half. It is to be noted that an epoxy resin isused as first resin 5 in the present first embodiment.

First, in injection process 45, first resin 5 in liquid form is injectedby a dispenser (not shown) or the like from central part 2 d of sideface 2 c of semiconductor device 2 shown in FIG. 3. As shown in FIG. 2,first resin 5 injected at this time reaches earlier a central part ofthe opposite side to the side from which first resin 5 was injected.Therefore, first resin 5 overflows in the central part of the oppositeside to the injection side, and creeps up along side face 2 c ofsemiconductor device 2 in the central part on the opposite side to theinjection side. Next, first resin 5 reaches the central part of sideface 2 c adjacent to the side from which first resin 5 was injected.First resin 5 then overflows from the central part of side face 2 cadjacent to the injection side, and creeps up along side face 2 c ofsemiconductor device 2. Finally, first resin 5 reaches corner part 6.This first resin 5 having reached this corner part 6 overflows in cornerpart 6, and creeps up in space 14 between semiconductor device 2 andelectronic component 3 due to the capillary phenomenon.

In this manner, first resin 5 is hardened in hardening process 46 afterinjection of first resin 5. Thereby, first resin 5 creeps up in space 14so that interface 2 e can be covered by first resin 5. Bond strengthenforcing resin section 5 a is formed between side face 2 c ofsemiconductor device 2 shown in FIG. 3 and substrate surface 12 a ofsubstrate 12 in the position corresponding to corner part 6, in thevicinity of corner part 6 of semiconductor device 2, shown in FIG. 1.Since bond strength enforcing resin section 5 a is formed forreinforcement, resin film 2 b of semiconductor device 2 is resistant topeeling off from interface 2 e even in the case of dropping and thelike. This can result in large dropping strength of semiconductormounting substrate 11.

It is to be noted that, at this time, an overall circumference ofinterface 2 e needs to be covered by first resin 5. In hardening process46 in the present first embodiment, heating and hardening are performedwith the surface of semiconductor device 2 turned downward, which is thesurface side where resin film 2 b is present out of the surfaces ofsemiconductor device 2. Thereby, first resin 5 with its viscosity oncereduced due to heat of hardening process 46 falls downward and ishardened, leading to further creep-up of first resin 5, so thatinterface 2 e is further tightly covered by first resin 5.

Additionally, in such a case, in injection process 45, it is previouslyarranged that at least first resin 5 having overflowed from thecircumference of semiconductor device 2 adheres to side face 2 c ofsemiconductor device 2. Further, in corner part 6 of semiconductordevice 2, it is desirably previously arranged that first resin 5 creepsup in space 14 so as to come into contact with insulating portion 3 b ofelectronic component 3. Thereby, first resin 5 becomes apt to flow alongside face 2 c of semiconductor device 2 and insulating portion 3 b ofelectronic component 3 in hardening process 46.

It is to be noted that, in the present first embodiment, corner part 6is arranged so as to correspond to insulating portion 3 b of electroniccomponent 3. This is because first resin 5 is apt to cover insulatingportion 3 b rather than solder 13, which prevents solder 13 fromremelting and belching even in the case of reheating semiconductormounting substrate 11.

Further, in the present first embodiment, connection conductor 18 isprovided in a position lower than insulating portion 3 b of electroniccomponent 3. This can make space 17 small so as to make first resin 5apt to creep up in space 14. Moreover, in the present first embodiment,connection conductor 18 is provided so as to mutually connect connectionlands 32. This can make space 17 small with respect to a whole lowerpart of insulating portion 3 b of electronic component 3.

Here, electronic component 3 may be mounted in a state either inparallel with or tilted against side face 2 c of semiconductor device 2.For example, when electronic component 3 is mounted in parallel withside face 2 c of semiconductor device 2, a creep-up range can bebroadened due to the capillary phenomenon. When electronic component 3is mounted as being tilted against corner part 6 of semiconductor device2, it is possible to make first resin 5 apt to creep up against twoadjacent faces forming corner part 6.

It is to be noted that mounting is preferably performed so as to locatecorner part 6 correspondingly to almost the central part of the sideface of electronic component 3. This is because, even in a case whereelectronic component 3 or semiconductor device 2 is mounted in aposition displaced from its original mounting position, insulatingportion 3 b can be reliably arranged in the vicinity of corner part 6.

Moreover, in the present first embodiment, non-formation section 34 a ofinsulating film 19 with respect to semiconductor device 2 is made largerthan a periphery of semiconductor device 2. This can make gap 16 betweensemiconductor device 2 and substrate 12 large, thereby making firstresin 5 to apt to flow. Thereby, a void or the like hardly occursbetween semiconductor device 2 and substrate 12.

Furthermore, non-formation section 34 a is provided with non-formationsection 34 b of insulating film 19, formed in a direction from thecorner toward electronic component 3. This can make first resin 5 havingreached corner part 6 apt to flow along non-formation section 34 b inthe direction toward electronic component 3

Second Embodiment

In the following, a second embodiment of the present invention isdescribed with reference to drawings. FIG. 16 is a plan view ofsemiconductor mounting substrate 11 in mounting process in the secondembodiment of the present invention. In FIG. 6, the same elements asthose in FIGS. 1 to 3 are provided with the same numerals so as tosimplify descriptions of those elements.

In mounting process 42 in the present second embodiment shown in FIG. 6,semiconductor device 2 and electronic components 3 are mounted onsubstrate 12 in the same manner as in the first embodiment. However,electronic component 3 is mounted in a position displaced from positionsof connection lands 32 in a direction away from semiconductor device 2.It is necessary to locate solder 13 and electronic component 3 so as tobe into contact with each other.

In reflow process 43, by melting of solder 13, electronic component 3moves to prescribed positions of connection lands 32. Here used is anaction of solder 13 moving electronic component 3 to a prescribedposition after occurrence of surface tension of solder 13 due to meltingthereof, namely a self-alignment phenomenon.

In this manner, electronic component 3 can be brought close to cornerpart 6 of semiconductor device 2. Hence space 14 can be made small sothat first resin 5 can be reliably creeping up in space 14. This resultsin formation of bond strength enforcing resin section 5 a in a positionof space 14.

Further, with the above-mentioned self-alignment used, space 14 betweensemiconductor device 2 and electronic component 3 can be made smallerthan gap 15 with which mounting can be performed with a mountingmachine. This is useful in size reduction of semiconductor mountingsubstrate 11 or gap 15 is made small for thickness reduction.

Third Embodiment

A third embodiment of the present invention is described with referenceto drawings. FIG. 7A is a plan view of semiconductor mounting substrate21 in the third embodiment of the present invention, and FIG. 7B is afront view of semiconductor mounting substrate 21 in the same. In FIGS.7A and 7B, semiconductor mounting substrate 21 is obtained by mountingchip components 3 a and semiconductor device 2 on substrate surface 12 aside of substrate 12. Here, chip components 3 a are connected and fixedto substrate 12 via solder 13, and semiconductor device 2 is flip-chipmounted on substrate 12 via solder bumps 4. Thermosetting first resin 5intervenes between semiconductor device 2 and substrate 12. With bondstrength enforcing resin section 5 a formed by this first resin 5,connection strength between semiconductor device 2 and substrate 12 ismaintained.

FIG. 8 is a manufacturing flowchart for semiconductor mounting substrate21 in the present third embodiment. It is to be noted that in FIG. 8,the same elements as those in FIG. 4 are provided with the same numeralsso as to simplify descriptions of those elements. In the following, aproduction process for semiconductor mounting substrate 21 in thepresent third embodiment is described in accordance with the order ofprocesses shown in this FIG. 8.

As shown in FIG. 8, connection member supplying process 41 is a processof supplying substrate 12 with solder 4 a and flux 4 b. It is to benoted that cream solder is used as solder 4 a. This cream solder isprinted by screen printing in positions where chip components 3 a aremounted. Further, flux 4 b is applied by transfer printing or the likein a position where semiconductor device 2 is mounted.

Next, mounting process 42 is a process of mounting chip components 3 aand semiconductor device 2 on substrate 12 after connection membersupplying process 41. Chip component 3 a and semiconductor device 2 aremounted with a spacing of about 0.15 mm. It is to be noted that solderbumps 4 are provided on the lower face side of semiconductor device 2.

FIG. 9A is a plan view of semiconductor mounting substrate 21 in reflowprocess 43 shown in FIG. 8. FIG. 9B is a front view of semiconductormounting substrate 21 in reflow process 43. In this reflow process 43,solder 13 and solder bumps 4 are melted so that chip component 3 a andsemiconductor device 2 are electrically and mechanically connected tosubstrate 12, as shown in FIGS. 9A and 9B.

Here, semiconductor device 2 includes a silicon substrate (not shown)and a rewiring layer (not shown) provided on this silicon substrate, apad terminal (not shown) is formed on this rewiring layer, and solderbumps 4 are connected to this pad terminal. It is to be noted that apolyimide resin is used for the insulating film in the rewiring layer inthe present third embodiment.

FIG. 10A is a plan view of semiconductor mounting substrate 21 ininjection process 45 as a first-half process of resin filling process 44in the present third embodiment. FIG. 10B is a front view ofsemiconductor mounting substrate 21 in injection process 45 in the same.As shown in FIG. 8, injection process 45 is a process of injecting firstresin 5 into the space between semiconductor device 2 and substrate 12.In this injection process 45, first resin 5 is injected by dispenser 5 bfrom the vicinity of the center of one side face 6 a of semiconductordevice 2, as shown in FIGS. 10A and 10B. However, first resin 5 isinjected so as not to come into contact with chip component 3 a andsolder 13 which are adjacent to semiconductor device 2 in injectionprocess 45. That is, first resin 5 is injected so has to hold a spacewith chip component 3 a and solder 13.

In this manner, it is possible to make solder 13 resistant to flowinginto the space between chip component 3 a and substrate 12 in the caseof soldering semiconductor mounting substrate 21 to a parent substrate(not shown). It is thus possible to make a short circuit due to solder13 below chip component 3 a hardly occur.

Further, in the same manner as in the first embodiment shown in FIG. 3,also in injection process 45 in the present third embodiment, firstresin 5 adheres not only to the space between substrate 12 andsemiconductor device 2 but to one side face 6 a of semiconductor device2. It is of importance at this time that first resin 5 is bonded to aheight not smaller than a height of an interface between the siliconsubstrate and the rewiring layer in semiconductor device 2 in aperipheral side face part of semiconductor device 2 in the same state asthat shown in FIG. 3. In such a manner, the interface between thesilicon substrate and the rewiring layer in semiconductor device 2 iscovered and protected by first resin 5 due to dropping impact, thermalimpact or the like. Consequently, cracking hardly occurs on thisinterface.

Here, a thermosetting resin is used as first resin 5. In hardeningprocess 46 after injection process 45, first resin 5 is heated and thenhardened. In the third present embodiment, in hardening process 46,heating is performed with the substrate surface 12 a where semiconductordevice 2 is turned upward. Here, in hardening process 46, hardening isperformed at a temperature lower than melting points of solder 13 andsolder bumps 4. It is to be noted that, although heating was performedwith substrate surface 12 a where semiconductor device 2 is mountedturned upward in hardening process 46 in the present third embodiment,heating may be performed with substrate surface 12 a turned downward.

In this manner, the first resin having become more mobile by heatingbecomes apt to move downward under the influence of gravity, so thatfirst resin 5 becomes apt to be bonded to a height not smaller than theheight of the interface between the silicon substrate and the rewiringlayer in semiconductor device 2. Therefore, semiconductor device 2becomes further less susceptible to dropping impact, thermal impact andthe like, and thereby cracking hardly occurs on the interface betweenthe silicon substrate and the rewiring layer in semiconductor device 2.

FIG. 11A is a plan view of semiconductor mounting substrate 21 in resinapplying process 47 in the present third embodiment. FIG. 11B is a frontview of semiconductor mounting substrate 21 in resin applying process 47in the same. In injection process 45, since an amount of first resin 5to be injected is reduced for preventing the resin from adhering to chipcomponent 3 a adjacent to semiconductor device 2, first resin 5 is notapplied to the side face in the vicinity of corner part 6 ofsemiconductor device 2, and a region is generated where side face 2 c ofsemiconductor device 2 is exposed. Here, in this resin applying process47, second resin 5 c is applied by dispenser 5 b to this exposed portionof semiconductor device 2. It is to be noted that in this resin applyingprocess 47, second resin 5 c is applied with substrate surface 12 awhere semiconductor device 2 is mounted turned upward. Thereby, secondresin 5 c flows in a direction to substrate 12, and then adheres to theexposed portion of side face 2 c of semiconductor device 2 and substrate12. It is to be noted that in the present third embodiment, second resin5 c is applied to two places with respect to each corner part 6, asshown in FIG. 11A.

Further, as second resin 5 c in resin applying process 47, a resin isused whose viscosity is larger than the viscosity of first resin 5 ininjection process 45. Therefore, in resin applying process 47, secondresin 5 c is less apt to flow than first resin 5 so that second resin 5c can be made resistant to adhering to chip component 3 a. Here, thesame resin is used as first resin 5 and second resin 5 c, and theviscosities of those resins are made different by changing a temperaturein application. In injection process 45 in the present third embodiment,for example, the temperature of first resin 5 in injection is set toabout 60° C. Further, in resin applying process 47, the temperature ofsecond resin 5 c in application is set to a constant temperature.

Inversion process 48 after resin applying process 47 shown in FIG. 8 isa process of inverting substrate surface 12 a, where semiconductordevice 2 is mounted, to be turned downward. Then, as shown in FIG. 12,next hardening process 49 is performed while substrate surface 12 aremains inverted as having done in inversion process 48. As thusdescribed, in hardening process 49, heating is performed with substratesurface 12 a where semiconductor device 2 is mounted turned downward.Therefore, due to a decrease in viscosity accompanied by an increase intemperature, second resin 5 c extends to a region where first resin 5has not been applied. Further, since second resin 5 c comes to droop tohead face 2 f side on side face 2 c of second resin 5 c, thickness 5 dof second resin 5 c can be made large in the interface position (notshown) between the silicon substrate and the rewiring layer insemiconductor device 2. In this manner, bond strength enforcing resinsection 5 a at least including a thermosetting resin obtained byhardening second resin 5 c is formed. Formation of this bond strengthenforcing resin section 5 a can further make cracking and the likehardly occur in this interface position. It is to be noted that inhardening process 49, hardening is performed at a temperature lower thanthe melting points of solder 13 and solder bumps 4.

Further, in FIGS. 7A and 7B, second resin 5 c with the viscositydescribed above may be thermally hardened and included in bond strengthenforcing resin section 5 a, to form part of bond strength enforcingresin section 5 a.

Subsequently, by hardening of second resin 5 c in hardening process 49,filling of first resin 5 and second resin 5 c between semiconductordevice 2 and substrate 12 is completed, to complete semiconductormounting substrate 21. In the present third embodiment, first resin 5 ishardened in hardening process 46 and second resin 5 c is hardened inhardening process 49. This can prevent first resin 5 from coming intocontact with chip component 3 a during the inverting operation ininversion process 48. Therefore, it is possible to reliably providespace 14 between first resin 5 and chip component 3 a or first resin 5and solder 13.

It is to be noted that first resin 5 may be hardened in hardeningprocess 49 in place of hardening process 46 concurrently with secondresin 5 c. This can reduce the number of heating to be applied tosemiconductor device 2 and electronic components 3. Therefore, a changein characteristic of semiconductor device 2, chip components 3 a or thelike hardly occurs. Further, since first resin 5 is also hardened withsubstrate surface 12 a where semiconductor device 2 is mounted turneddownward, first resin 5 further flows to side face 2 c side ofsemiconductor device 2. This can increase the thickness of first resin 5in the vicinity of the interface between the silicon substrate and therewiring layer, so that cracking hardly occurs in the vicinity of theinterface.

Moreover, in the present third embodiment, first resin 5 was bonded tothe height larger than the height of the interface between the siliconsubstrate and the rewiring layer in semiconductor device 2 so as to beresistant to dropping impact. However, when dropping-impact resistantstrength is not much required, first resin 5 may be injected to a degreeso as not to protrude from an outer shape of semiconductor device 2 ininjection process 45, and second resin 5 c may be applied to a regionwhere first resin 5 is insufficient and has not been applied (e.g. thevicinity of corner part 6) in resin applying process 47. In this case,since an amount of first resin 5 protruding from semiconductor device 2can be reduced, the distance between semiconductor device 2 and chipcomponent 3 a can be made even smaller. In this manner, mounting ofsemiconductor mounting substrate 21 can be performed with even higherdensity.

INDUSTRIAL APPLICABILITY

The semiconductor mounting substrate and the method for manufacturingthe same according to the present invention have an effect of increasingdropping strength of a mounted semiconductor device and also reducing agap between the mounted semiconductor device and electronic component,and are useful especially when applied to devices requiring largedropping strength and size reduction.

1. A method for manufacturing a semiconductor mounting substrate,comprising: supplying solder onto connection lands provided on asubstrate; mounting a semiconductor device and electronic components onthe connection lands on the substrate, the semiconductor device having asilicon substrate and a resin layer provided on a face of the siliconsubstrate; heating the semiconductor device and the electroniccomponents on the substrate so as to connect the semiconductor deviceand the electronic components onto the connection lands on the substrateby reflowing the solder; filling a first resin by injection into a spacebetween the semiconductor device and the substrate from a central partof a side face of the semiconductor device; and hardening the firstresin, wherein, after injection and filling of the first resin into atleast the space, the first resin forms a bond strength reinforcing resinsection between a side face in the vicinity of a corner part of thesemiconductor device and a surface of the substrate in a positioncorresponding to the corner part, wherein the first resin of the bondstrength reinforcing resin section covers an interface between thesilicon substrate and the resin layer of the semiconductor device. 2.The method for manufacturing a semiconductor mounting substrateaccording to claim 1, wherein in said mounting of the semiconductordevice and the electronic components, the semiconductor device and anelectronic component are mounted with a prescribed spacing heldtherebetween so as to form a space, where the first resin can creep up,between the corner part of the semiconductor device and the electroniccomponent, and in said filling of the first resin, the first resin ismade to creep up in the space between the side face of the semiconductordevice and the side face of the electronic component, to form the bondstrength reinforcing resin section.
 3. The method for manufacturing asemiconductor mounting substrate according to claim 2, wherein in saidmounting of the semiconductor device and the electronic component, theelectronic component is located in the vicinity of the corner part ofthe semiconductor device and in a position displaced in a direction awayfrom the semiconductor device, from positions of the connection landswhere the electronic component should be mounted, the electroniccomponent is mounted in a position where the electronic component can bein contact with cream solder, and the electronic component is broughtcloser to the corner part side of the semiconductor device and thenheated.
 4. The method for manufacturing a semiconductor mountingsubstrate according to claim 1, further comprising: applying a secondresin to the vicinity of the corner part of the semiconductor deviceafter said filling of the first resin, wherein the first resin and thesecond resin are made of a thermosetting resin, a viscosity of thesecond resin in said applying of the second resin is larger than aviscosity of the first resin in said filling of the first resin, and thebond strength reinforcing resin section at least includes athermosetting resin obtained by hardening the second resin.
 5. Themethod for manufacturing a semiconductor mounting substrate according toclaim 4, wherein the second resin is hardened with the substrate surfacewhere the semiconductor device is mounted turned downward.
 6. The methodfor manufacturing a semiconductor mounting substrate according to claim4, wherein a temperature of the second resin in said applying of thesecond resin is lower than a temperature of the first resin in saidfilling of the first resin.
 7. The method for manufacturing asemiconductor mounting substrate according to claim 6, wherein the firstresin and the second resin are made of the same resin.
 8. The method formanufacturing a semiconductor mounting substrate according to claim 4,wherein the first resin is hardened prior to said applying of the secondresin.
 9. The method for manufacturing a semiconductor mountingsubstrate according to claim 8, wherein the first resin is hardened withthe substrate surface where the semiconductor device is mounted turneddownward.
 10. The method for manufacturing a semiconductor mountingsubstrate according to claim 4, wherein the first resin is hardenedconcurrently with the second resin.
 11. The method for manufacturing asemiconductor mounting substrate according to claim 4, wherein in saidfilling of the first resin, the first resin is filled so as to provide aspace between the first resin having flown out from the space betweenthe semiconductor device and the substrate and solder formed on theelectronic component.
 12. The method for manufacturing a semiconductormounting substrate according to claim 4, wherein the first resin ishardened prior to said applying of the second resin, and is hardenedwith the substrate surface where the semiconductor device is mountedturned downward, and in said applying of the second resin, the secondresin is applied to an exposed portion of the side face of thesemiconductor device.